Invention Grant
US08482855B2 Dielectric coated metal diffraction grating with high reflection resistance to a femtosecond mode flow 有权
介电涂层金属衍射光栅,具有对飞秒模式流的高反射电阻

  • Patent Title: Dielectric coated metal diffraction grating with high reflection resistance to a femtosecond mode flow
  • Patent Title (中): 介电涂层金属衍射光栅,具有对飞秒模式流的高反射电阻
  • Application No.: US13318170
    Application Date: 2010-04-28
  • Publication No.: US08482855B2
    Publication Date: 2013-07-09
  • Inventor: Frederic Desserouer
  • Applicant: Frederic Desserouer
  • Applicant Address: FR Longjumeau
  • Assignee: Horiba Jobin Yvon SAS
  • Current Assignee: Horiba Jobin Yvon SAS
  • Current Assignee Address: FR Longjumeau
  • Agency: Young & Thompson
  • Priority: FR0952832 20090429
  • International Application: PCT/FR2010/050808 WO 20100428
  • International Announcement: WO2010/125308 WO 20101104
  • Main IPC: G02B5/18
  • IPC: G02B5/18 G02B3/08 H01S3/08
Dielectric coated metal diffraction grating with high reflection resistance to a femtosecond mode flow
Abstract:
A reflection metal diffraction grating has a high diffraction efficiency for diffracting femtosecond mode laser pulses, and includes a substrate with a set of lines having a pitch A. The substrate is made of metal or covered with a metal layer, and the grating includes a thin film of dielectric material having a thickness, the dielectric film covering the metal surface of the lines of the grating, the grating being suitable for receiving a pulsed electromagnetic lightwave in a femtosecond mode. The thickness of the dielectric thin film is lower than 50 nm, and is suitable for reducing by a third order factor at least the maximum of the square of the electric field of the electromagnetic lightwave on the metal surface and in the metal layer of the substrate as compared to the square of the electric field at the surface of a metal grating not having a dielectric thin film.
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