Invention Grant
US08483870B2 Substrate processing apparatus and method of displaying abnormal state of substrate processing apparatus 有权
基板处理装置及显示基板处理装置的异常状态的方法

Substrate processing apparatus and method of displaying abnormal state of substrate processing apparatus
Abstract:
Provided are a substrate processing apparatus and a method of displaying an abnormal state of the substrate processing apparatus. The substrate processing apparatus including: a manipulation unit including a manipulation screen displaying a state of at least one of a substrate carrying mechanism and a substrate processing mechanism; and a control unit including a carrying system controller controlling the substrate carrying mechanism. The manipulation unit comprises a setting screen through which detection conditions of sensors configured to detect states of the substrate carrying mechanism and the substrate processing mechanism, and information about a torque limitation including the enabling or disabling of the torque control and a torque control value are set for the substrate carrying mechanism. The carrying system controller assigns a motion of the substrate carrying mechanism to a carrying control module based on an instruction from the manipulation unit, and the carrying control module controls the substrate carrying mechanism according to the instruction and the information.
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