Invention Grant
- Patent Title: Substrate processing apparatus and method of displaying abnormal state of substrate processing apparatus
- Patent Title (中): 基板处理装置及显示基板处理装置的异常状态的方法
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Application No.: US12704910Application Date: 2010-02-12
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Publication No.: US08483870B2Publication Date: 2013-07-09
- Inventor: Osamu Morita
- Applicant: Osamu Morita
- Applicant Address: JP Tokyo
- Assignee: Hitachi Kokusai Electric Inc.
- Current Assignee: Hitachi Kokusai Electric Inc.
- Current Assignee Address: JP Tokyo
- Agency: Brundidge & Stanger, P.C.
- Priority: JP2009-031613 20090213; JP2010-003088 20100108
- Main IPC: G06F7/00
- IPC: G06F7/00

Abstract:
Provided are a substrate processing apparatus and a method of displaying an abnormal state of the substrate processing apparatus. The substrate processing apparatus including: a manipulation unit including a manipulation screen displaying a state of at least one of a substrate carrying mechanism and a substrate processing mechanism; and a control unit including a carrying system controller controlling the substrate carrying mechanism. The manipulation unit comprises a setting screen through which detection conditions of sensors configured to detect states of the substrate carrying mechanism and the substrate processing mechanism, and information about a torque limitation including the enabling or disabling of the torque control and a torque control value are set for the substrate carrying mechanism. The carrying system controller assigns a motion of the substrate carrying mechanism to a carrying control module based on an instruction from the manipulation unit, and the carrying control module controls the substrate carrying mechanism according to the instruction and the information.
Public/Granted literature
- US20100211216A1 SUBSTRATE PROCESSING APPARATUS AND METHOD OF DISPLAYING ABNORMAL STATE OF SUBSTRATE PROCESSING APPARATUS Public/Granted day:2010-08-19
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