Invention Grant
- Patent Title: In situ emission measurement for process control equipment
- Patent Title (中): 过程控制设备的原位排放测量
-
Application No.: US12887791Application Date: 2010-09-22
-
Publication No.: US08483998B2Publication Date: 2013-07-09
- Inventor: Michel Ken Lovell , Carter B. Cartwright
- Applicant: Michel Ken Lovell , Carter B. Cartwright
- Applicant Address: US IA Marshalltown
- Assignee: Fisher Controls International LLC
- Current Assignee: Fisher Controls International LLC
- Current Assignee Address: US IA Marshalltown
- Agency: Marshall, Gerstein & Borun LLP
- Main IPC: G06F3/00
- IPC: G06F3/00

Abstract:
A system and method for accurately measuring supply gas consumed by a particular process control component within a process control system is disclosed. Enhanced measurement accuracy is derived from measuring the consumption of the process control component in a normal operating mode of the process control system. The amount of fluid expended by one process control component is separated by a fluid control system from the amount of supply gas expended in actuating other process control components. The amount of fluid expended by each component may be determined by measuring a decrease in a fluid within a vessel having a known quantity that independently supplies supply gas to each component during its operation.
Public/Granted literature
- US20110071688A1 IN SITU EMISSION MEASUREMENT FOR PROCESS CONTROL EQUIPMENT Public/Granted day:2011-03-24
Information query