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US08484585B2 Method for controlling pattern uniformity of semiconductor device 有权
控制半导体器件图案均匀性的方法

Method for controlling pattern uniformity of semiconductor device
Abstract:
A method for controlling uniformity of patterns formed in a semiconductor device includes obtaining simulation contours with respect to respective cases while controlling a size of an outermost pattern and determining a size of the outermost pattern in which uniform distribution values (3σ) value of patterns included in the simulation contours satisfying specific conditions as a size of target outermost pattern.
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