Invention Grant
- Patent Title: System and method of predicting problematic areas for lithography in a circuit design
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Application No.: US13517811Application Date: 2012-06-14
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Publication No.: US08484586B2Publication Date: 2013-07-09
- Inventor: Timothy A. Brunner , Stephen E. Greco , Bernhard R. Liegl , Hua Xiang
- Applicant: Timothy A. Brunner , Stephen E. Greco , Bernhard R. Liegl , Hua Xiang
- Applicant Address: US OR Wilsonville
- Assignee: Mentor Graphics Corporation
- Current Assignee: Mentor Graphics Corporation
- Current Assignee Address: US OR Wilsonville
- Agency: Klarquist Sparkman, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G02B7/04 ; H01L27/00
Abstract:
A system and method is provided which predicts problematic areas for lithography in a circuit design, and more specifically, which uses modeling data from a modeling tool to accurately predict problematic lithographic areas. The method includes identifying surface heights of plurality of tiles of a modeled wafer, and mathematically mimicking a lithographic tool to determine best planes of focus for exposure for the plurality of tiles.
Public/Granted literature
- US20120254812A1 SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY IN A CIRCUIT DESIGN Public/Granted day:2012-10-04
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