Invention Grant
- Patent Title: Nozzle plate, droplet discharge head, method for manufacturing the same and droplet discharge device
- Patent Title (中): 喷嘴板，液滴喷射头，制造方法和液滴喷射装置
-
Application No.: US12120403Application Date: 2008-05-14
-
Publication No.: US08485640B2Publication Date: 2013-07-16
- Inventor: Kazufumi Oya , Katsuji Arakawa
- Applicant: Kazufumi Oya , Katsuji Arakawa
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2007-159811 20070618
- Main IPC: B41J2/14
- IPC: B41J2/14
Abstract:
A nozzle plate includes a silicon substrate, and a nozzle hole formed in the silicon substrate for discharging a liquid droplet provided with: a first nozzle portion formed perpendicularly to a surface of the silicon substrate; a second nozzle portion formed on a same axis as an axis of the first nozzle portion and having a cross-sectional area that is larger than a cross-sectional area of the first nozzle portion; and an inclined portion having a cross-sectional area gradually increasing from the first nozzle portion to the second nozzle portion.
Public/Granted literature
- US20080309718A1 NOZZLE PLATE, DROPLET DISCHARGE HEAD, METHOD FOR MANUFACTURING THE SAME AND DROPLET DISCHARGE DEVICE Public/Granted day:2008-12-18
Information query
IPC分类:
