Invention Grant
- Patent Title: Method of manufacturing a part of a MEMS system
- Patent Title (中): 制造MEMS系统的一部分的方法
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Application No.: US13607885Application Date: 2012-09-10
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Publication No.: US08486218B2Publication Date: 2013-07-16
- Inventor: Shintaro Asuke
- Applicant: Shintaro Asuke
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2008-56855 20080306
- Main IPC: B32B27/00
- IPC: B32B27/00 ; B32B37/30

Abstract:
A method of manufacturing a bonded body of a semiconductor substrate and a semiconductor device to be mounted on the semiconductor substrate are provided. The method includes: preparing a first base member and a second base member; imparting liquid repellency for a liquid material to at least a part of a bonding film non-formation region of the first base member to form a liquid repellent region thereon; supplying the liquid material onto the first base member to selectively form a liquid coating on a bonding film formation region of the first base member; drying the liquid coating to obtain a bonding film on the bonding film formation region; and bonding the first base member and the second base member together through the bonding film due to a bonding property developed in a vicinity of a surface of the bonding film to thereby obtain the bonded body.
Public/Granted literature
- US20130001810A1 Method of Manufacturing a Part of a MEMS System Public/Granted day:2013-01-03
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