Invention Grant
- Patent Title: Pattern formation employing self-assembled material
- Patent Title (中): 采用自组装材料的图案形成
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Application No.: US13430177Application Date: 2012-03-26
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Publication No.: US08486511B2Publication Date: 2013-07-16
- Inventor: Charles T. Black , Timothy J. Dalton , Bruce B. Doris , Carl J. Radens
- Applicant: Charles T. Black , Timothy J. Dalton , Bruce B. Doris , Carl J. Radens
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Katherine S. Brown, Esq.
- Main IPC: B32B3/00
- IPC: B32B3/00

Abstract:
In one embodiment, Hexagonal tiles encompassing a large are divided into three groups, each containing ⅓ of all hexagonal tiles that are disjoined among one another. Openings for the hexagonal tiles in each group are formed in a template layer, and a set of self-assembling block copolymers is applied and patterned within each opening. This process is repeated three times to encompass all three groups, resulting in a self-aligned pattern extending over a wide area. In another embodiment, the large area is divided into rectangular tiles of two non-overlapping and complementary groups. Each rectangular area has a width less than the range of order of self-assembling block copolymers. Self-assembled self-aligned line and space structures are formed in each group in a sequential manner so that a line and space pattern is formed over a large area extending beyond the range of order.
Public/Granted literature
- US20120183736A1 PATTERN FORMATION EMPLOYING SELF-ASSEMBLED MATERIAL Public/Granted day:2012-07-19
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