Invention Grant
US08487279B2 Gas contamination sensor, lithographic apparatus, method of determining a level of contaminant gas and device manufacturing method
失效
气体污染传感器，光刻设备，确定污染物气体水平的方法和装置制造方法
- Patent Title: Gas contamination sensor, lithographic apparatus, method of determining a level of contaminant gas and device manufacturing method
- Patent Title (中): 气体污染传感器，光刻设备，确定污染物气体水平的方法和装置制造方法
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Application No.: US12683598Application Date: 2010-01-07
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Publication No.: US08487279B2Publication Date: 2013-07-16
- Inventor: Jens Arno Steinhoff
- Applicant: Jens Arno Steinhoff
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G21K5/04
- IPC: G21K5/04
Abstract:
A gas contamination sensor includes an ion source configured to generate a beam of ions from a sample of gas to be tested, and first and second ion detectors, each positioned to receive ions from the beam of ions that are deflected by different extents. The first ion detector is configured to receive ions generated from a primary gas in the gas being tested, and the second ion detector is configured to receive ions that are generated from the contaminant gas within the sample being tested.
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