Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US13473339Application Date: 2012-05-16
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Publication No.: US08487312B2Publication Date: 2013-07-16
- Inventor: Yukio Maki
- Applicant: Yukio Maki
- Applicant Address: JP Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kanagawa
- Agency: McDermott Will & Emery
- Priority: JP2011-125502 20110603
- Main IPC: H01L29/04
- IPC: H01L29/04

Abstract:
To provide a semiconductor device with a TFT, capable of reducing the electric resistance of a power supply wiring without increasing the off-current. The semiconductor device includes an insulating film with a surface; a semiconductor layer which is formed over the surface of the insulating film and which includes a channel region and a pair of source/drain regions and sandwiching the channel region; and a power supply wiring for supplying power to the source region. A concave portion is formed in the surface of the insulating film. The power supply wiring includes a layer formed from the same layer as the semiconductor layer, and has a first portion formed over the surface of the insulating film and a second portion formed in the concave portion. The bottom of the second portion is covered with an insulator.
Public/Granted literature
- US20120306029A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2012-12-06
Information query
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