Invention Grant
US08488100B2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
有权
在浸没式光刻机中的晶片更换期间，将投影透镜下方的间隙中的浸没流体保持在装置和方法
- Patent Title: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
- Patent Title (中): 在浸没式光刻机中的晶片更换期间，将投影透镜下方的间隙中的浸没流体保持在装置和方法
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Application No.: US12923822Application Date: 2010-10-08
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Publication No.: US08488100B2Publication Date: 2013-07-16
- Inventor: Michael Binnard
- Applicant: Michael Binnard
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/58
Abstract:
An immersion exposure apparatus exposes a substrate with a light beam. The apparatus includes an optical member through which the light beam is irradiated onto the substrate, a substrate table which holds the substrate and is movable relative to the optical member, and a pad member which is movable relative to the substrate table and is positionable opposite to the optical member in place of the substrate table to substantially maintain an immersion liquid in a space under the optical member when the substrate table is moved away from under the optical member. The substrate table and the pad member are relatively tilted and/or moved in a vertical direction before the substrate table is moved away from under the optical member.
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