Invention Grant
US08488103B2 Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same
有权
用于UV辐射反射的光学元件,其制造方法和包括该光学元件的投影曝光设备
- Patent Title: Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same
- Patent Title (中): 用于UV辐射反射的光学元件,其制造方法和包括该光学元件的投影曝光设备
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Application No.: US12780035Application Date: 2010-05-14
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Publication No.: US08488103B2Publication Date: 2013-07-16
- Inventor: Alexandra Pazidis , Christoph Zaczek , Horst Feldermann , Peter Huber
- Applicant: Alexandra Pazidis , Christoph Zaczek , Horst Feldermann , Peter Huber
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Sughrue Mion, PLLC
- Priority: DE102007054731 20071114
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G02B5/08

Abstract:
An optical element (1a, 1b) for reflecting UV radiation at an operating wavelength below 250 nm, preferably at 193 nm, which has a substrate (2a, 2b), a reflective layer (3a, 3b) made of aluminum superimposed on the substrate (2a, 2b). The reflective aluminum layer (3a, 3b) is not transparent to UV radiation and is (111)-plane oriented. The reflective optical element (1a, 1b) has a reflectivity of more than 85%, preferably of more than 88%, and even more preferably of more than 92%, in a range of incident angles of at least 10°, preferably of at least 15°, at the operating wavelength. Also disclosed is an optical element having a reflective layer made from a material having a melting point higher than that of aluminum, as well as methods for producing such optical elements, and optical arrangements incorporating such optical elements.
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