Invention Grant
US08488103B2 Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same 有权
用于UV辐射反射的光学元件,其制造方法和包括该光学元件的投影曝光设备

Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same
Abstract:
An optical element (1a, 1b) for reflecting UV radiation at an operating wavelength below 250 nm, preferably at 193 nm, which has a substrate (2a, 2b), a reflective layer (3a, 3b) made of aluminum superimposed on the substrate (2a, 2b). The reflective aluminum layer (3a, 3b) is not transparent to UV radiation and is (111)-plane oriented. The reflective optical element (1a, 1b) has a reflectivity of more than 85%, preferably of more than 88%, and even more preferably of more than 92%, in a range of incident angles of at least 10°, preferably of at least 15°, at the operating wavelength. Also disclosed is an optical element having a reflective layer made from a material having a melting point higher than that of aluminum, as well as methods for producing such optical elements, and optical arrangements incorporating such optical elements.
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