Invention Grant
US08488128B2 Line edge roughness measuring technique and test structure 有权
线边粗糙度测量技术和测试结构

Line edge roughness measuring technique and test structure
Abstract:
A test structure is presented test structure on a substrate for monitoring a LER and/or LWR effect, said test structure comprising an array of features manufactured with amplified LER and/or LWR effect.
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