Invention Grant
- Patent Title: Power and ground vias for power distribution systems
- Patent Title (中): 配电系统的电源和接地通孔
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Application No.: US12776888Application Date: 2010-05-10
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Publication No.: US08488329B2Publication Date: 2013-07-16
- Inventor: Tae H. Kim , Sang Y. Lee , Nam H. Pham
- Applicant: Tae H. Kim , Sang Y. Lee , Nam H. Pham
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Olive Law Group, PLLC
- Agent Thomas E. Tyson
- Main IPC: H05K7/00
- IPC: H05K7/00 ; H05K1/11

Abstract:
A system for providing power and ground vias for power distributions systems includes first and second conductive layers on a microelectronic package. The conductive layers may include one or more conductive components such as, but not limited to, power planes, ground planes, pads, traces, and the like for electrically connecting to electronic components. A via may electrically connect the first and second conductive layers. The via may have a cross-section of at least three partially-overlapping shapes. Each of the shapes partially overlaps at least two of the other shapes. The shapes may be, for example, circular, triangular, rectangular, square, polygonal, rhomboidal shape, or any other shape.
Public/Granted literature
- US20110273855A1 POWER AND GROUND VIAS FOR POWER DISTRIBUTION SYSTEMS Public/Granted day:2011-11-10
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