In accordance with some embodiments of the present disclosure, a method may include generating a first current equal to a bandgap voltage divided by a resistance selected to approximately match a process resistance integral to a receiver. The method may further include generating a second current equal to temperature-dependent current multiplied by a predetermined scaling factor. The method may also include subtracting the second current from the first current to generate a bias current. The method may additionally include providing the bias current to the receiver.