Invention Grant
- Patent Title: Pattern learning system
- Patent Title (中): 模式学习系统
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Application No.: US12750440Application Date: 2010-03-30
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Publication No.: US08489522B1Publication Date: 2013-07-16
- Inventor: Michael J. Hirsch , John T. Geiss
- Applicant: Michael J. Hirsch , John T. Geiss
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Agency: Cantor Colburn LLP
- Main IPC: G06F15/18
- IPC: G06F15/18 ; G06F13/00 ; G06E1/02

Abstract:
According to one embodiment, a pattern learning system includes a pattern learning tool that receives event messages in a sequential manner from multiple sensors and forms multiple sub-sequences that each includes a trigger event message, a consequence event message, and one or more intermediary event messages. The pattern learning tool then generates multiple graphs that each represents a sub-sequence of the plurality of event messages. The pattern learning tool then combines the graphs into a combined graph according to a type of each event message, and determines a causal sequence from the combined graph according to a heaviest weighted directed path from the trigger event message to the consequence event message.
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