Invention Grant
US08490209B2 Surface state measuring device, and surface state measuring method using the device
有权
表面状态测量装置和使用该装置的表面状态测量方法
- Patent Title: Surface state measuring device, and surface state measuring method using the device
- Patent Title (中): 表面状态测量装置和使用该装置的表面状态测量方法
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Application No.: US12852635Application Date: 2010-08-09
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Publication No.: US08490209B2Publication Date: 2013-07-16
- Inventor: Hitoshi Saito
- Applicant: Hitoshi Saito
- Applicant Address: JP Akita-shi
- Assignee: Akita University
- Current Assignee: Akita University
- Current Assignee Address: JP Akita-shi
- Agency: Ladas & Parry LLP
- Priority: JP2008-031128 20080212; JP2008-231530 20080909
- Main IPC: G01Q20/00
- IPC: G01Q20/00

Abstract:
Provided are a surface state measuring device which can measure an alternating force of an arbitrary frequency and which is excellent in spatial resolution, and a surface state measuring method using the device. This surface state measuring device measures the surface state of a sample by detecting the modulation of the oscillation of a probe arranged above the sample. The measuring device comprises: a cantilever having a probe near a free end; an excitation mechanism for exciting the cantilever; a scanning mechanism for making the probe scan the sample by moving the probe and the sample relative to each other; and alternating force generator for generating an alternating force of an arbitrary frequency in a space; and a modulation measuring mechanism for measuring the degree of frequency modulation or amplitude modulation of the oscillations of the probe, which are generated by the alternating force.
Public/Granted literature
- US20110030109A1 SURFACE STATE MEASURING DEVICE, AND SURFACE STATE MEASURING METHOD USING THE DEVICE Public/Granted day:2011-02-03
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