Invention Grant
US08490660B2 Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber 有权
用于在处理室中支撑,定位和旋转衬底的装置和方法

Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber
Abstract:
An apparatus and method for supporting, positioning and rotating a substrate are provided. In one embodiment, a support assembly for supporting a substrate includes an upper base plate and a lower base plate. The substrate is floated on a thin layer of air over the upper base plate. A positioning assembly includes a plurality of air bearing edge rollers or air flow pockets used to position the substrate in a desired orientation inside above the upper base plate. A plurality of slanted apertures or air flow pockets are configured in the upper base plate for flowing gas therethrough to rotate the substrate to ensure uniform heating during processing.
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