Invention Grant
US08491802B1 Method of forming a dielectric slope for EAMR and magnetic writer
有权
形成EAMR和磁性写入器介质斜率的方法
- Patent Title: Method of forming a dielectric slope for EAMR and magnetic writer
- Patent Title (中): 形成EAMR和磁性写入器介质斜率的方法
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Application No.: US13042819Application Date: 2011-03-08
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Publication No.: US08491802B1Publication Date: 2013-07-23
- Inventor: Wei Gao , Dujiang Wan , Zhihong Zhang , Lijun Tong
- Applicant: Wei Gao , Dujiang Wan , Zhihong Zhang , Lijun Tong
- Applicant Address: US CA Fremont
- Assignee: Western Digital (Fremont), LLC
- Current Assignee: Western Digital (Fremont), LLC
- Current Assignee Address: US CA Fremont
- Main IPC: B29D11/00
- IPC: B29D11/00 ; C03C15/00

Abstract:
A method of forming an energy assisted magnetic recording (EAMR) writer is disclosed. A structure comprising a bottom cladding layer and a near field transducer (NFT) is provided. A patterned sacrificial layer is formed over the structure. A top cladding layer is deposited over the patterned sacrificial layer and a remaining region of the structure not covered by the patterned sacrificial layer. A patterned resist is formed over the top cladding layer. A first etching operation is performed on the top cladding layer via the patterned resist, whereby a top cladding having a sloped region is formed. The patterned sacrificial layer provides an etch stop for the first etching operation.
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