Invention Grant
- Patent Title: Abrasive liquid for metal and method for polishing
- Patent Title (中): 金属研磨液和抛光方法
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Application No.: US13218590Application Date: 2011-08-26
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Publication No.: US08491807B2Publication Date: 2013-07-23
- Inventor: Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
- Applicant: Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.,Hitachi, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.,Hitachi, Ltd.
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP10-245616 19980831; JP10-351188 19981210
- Main IPC: H01L21/302
- IPC: H01L21/302
Abstract:
An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.
Public/Granted literature
- US20120048830A1 Abrasive Liquid For Metal and Method for Polishing Public/Granted day:2012-03-01
Information query
IPC分类:
