Invention Grant
US08492194B2 Chemical mechanical polishing stop layer for fully amorphous phase change memory pore cell
有权
化学机械抛光停止层,用于完全非晶相变记忆孔细胞
- Patent Title: Chemical mechanical polishing stop layer for fully amorphous phase change memory pore cell
- Patent Title (中): 化学机械抛光停止层,用于完全非晶相变记忆孔细胞
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Application No.: US13102550Application Date: 2011-05-06
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Publication No.: US08492194B2Publication Date: 2013-07-23
- Inventor: Matthew J. Breitwisch , Chung H. Lam
- Applicant: Matthew J. Breitwisch , Chung H. Lam
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: H01L21/06
- IPC: H01L21/06 ; H01L21/108 ; H01L21/44 ; H01L21/20

Abstract:
A method for fabricating a phase change memory pore cell that includes forming a bottom electrode, forming a dielectric layer on the bottom electrode, and forming a sacrificial layer on the dielectric layer. The method further includes selectively etching portions of the sacrificial layer and the dielectric layer to define a pore extending through the sacrificial layer and the dielectric layer, depositing phase change material on the sacrificial layer and into the pore and removing the phase change material formed outside the pore, removing the sacrificial layer to expose the pore, the pore being vertically aligned, and forming a top electrode over the pore.
Public/Granted literature
- US20110210307A1 CHEMICAL MECHANICAL POLISHING STOP LAYER FOR FULLY AMORPHOUS PHASE CHANGE MEMORY PORE CELL Public/Granted day:2011-09-01
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