Invention Grant
US08492831B2 Vertical non-volatile memory device and method of fabricating the same 有权
垂直非易失性存储器件及其制造方法

Vertical non-volatile memory device and method of fabricating the same
Abstract:
A vertical non-volatile memory device is structured/fabricated to include a substrate, groups of memory cell strings each having a plurality of memory transistors distributed vertically so that the memory throughout multiple layers on the substrate, integrated word lines coupled to sets of the memory transistors, respectively, and stacks of word select lines. The memory transistors of each set are those transistors, of one group of the memory cell strings, which are disposed in the same layer above the substrate. The word select lines are respectively connected to the integrated word lines.
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