Invention Grant
- Patent Title: Vertical non-volatile memory device and method of fabricating the same
- Patent Title (中): 垂直非易失性存储器件及其制造方法
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Application No.: US12636912Application Date: 2009-12-14
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Publication No.: US08492831B2Publication Date: 2013-07-23
- Inventor: Sung-min Hwang , Han-soo Kim , Won-seok Cho , Jae-hoon Jang , Sun-il Shim , Jae-hun Jeong , Ki-hyun Kim
- Applicant: Sung-min Hwang , Han-soo Kim , Won-seok Cho , Jae-hoon Jang , Sun-il Shim , Jae-hun Jeong , Ki-hyun Kim
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2009-0067009 20090722
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A vertical non-volatile memory device is structured/fabricated to include a substrate, groups of memory cell strings each having a plurality of memory transistors distributed vertically so that the memory throughout multiple layers on the substrate, integrated word lines coupled to sets of the memory transistors, respectively, and stacks of word select lines. The memory transistors of each set are those transistors, of one group of the memory cell strings, which are disposed in the same layer above the substrate. The word select lines are respectively connected to the integrated word lines.
Public/Granted literature
- US20110018036A1 VERTICAL NON-VOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2011-01-27
Information query
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