Invention Grant
- Patent Title: Beta voltaic semiconductor diode fabricated from a radioisotope
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Application No.: US12949457Application Date: 2010-11-18
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Publication No.: US08492861B1Publication Date: 2013-07-23
- Inventor: Bryan George Moosman , Richard Lee Waters
- Applicant: Bryan George Moosman , Richard Lee Waters
- Applicant Address: US DC Washington
- Assignee: The United States of America as represented by the Secretary of the Navy
- Current Assignee: The United States of America as represented by the Secretary of the Navy
- Current Assignee Address: US DC Washington
- Agent Kyle Eppele; Stephen E. Baldwin
- Main IPC: H01L43/00
- IPC: H01L43/00

Abstract:
In one preferred embodiment, a semiconductor diode includes a first layer formed with a p-type semiconductor, a second layer formed with an n-type semiconductor, and a third active depletion layer contained between the first and second layers. The third layer is formed with a radioisotope of the p-type and n-type semiconductors (preferably Si 32) such that initial emission of beta particles begins in the active depletion region and substantially all of the emitted beta particles are contained within the first, second and third layers during operation. The p-type and n-type layers each have sufficient depth to contain substantially all of beta particles emitted from the depletion layer. The depth of each of the p-type and n-type layers is substantially equal to or greater than the maximum beta emission depth of the radioisotope.
Information query
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