Invention Grant
- Patent Title: One-time programmable device having an LDMOS structure
- Patent Title (中): 具有LDMOS结构的一次性可编程器件
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Application No.: US13252880Application Date: 2011-10-04
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Publication No.: US08493767B2Publication Date: 2013-07-23
- Inventor: Akira Ito , Xiangdong Chen
- Applicant: Akira Ito , Xiangdong Chen
- Applicant Address: US CA Irvine
- Assignee: Broadcom Corporation
- Current Assignee: Broadcom Corporation
- Current Assignee Address: US CA Irvine
- Agency: Farjami & Farjami LLP
- Main IPC: G11C17/00
- IPC: G11C17/00 ; H01L23/52

Abstract:
According to one embodiment, a one-time programmable (OTP) device having a lateral diffused metal-oxide-semiconductor (LDMOS) structure comprises a pass gate including a pass gate electrode and a pass gate dielectric, and a programming gate including a programming gate electrode and a programming gate dielectric. The programming gate is spaced from the pass gate by a drain extension region of the LDMOS structure. The LDMOS structure provides protection for the pass gate when a programming voltage for rupturing the programming gate dielectric is applied to the programming gate electrode. A method for producing such an OTP device comprises forming a drain extension region, fabricating a pass gate over a first portion of the drain extension region, and fabricating a programming gate over a second portion of the drain extension region.
Public/Granted literature
- US20130082325A1 One-Time Programmable Device Having an LDMOS Structure and Related Method Public/Granted day:2013-04-04
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