Invention Grant
- Patent Title: Cleaning apparatus and cleaning method
- Patent Title (中): 清洁装置和清洁方法
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Application No.: US12860567Application Date: 2010-08-20
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Publication No.: US08496016B2Publication Date: 2013-07-30
- Inventor: Mitsuo Takeuchi , Michinao Nomura , Toshinori Kasuga , Hiroaki Tamura
- Applicant: Mitsuo Takeuchi , Michinao Nomura , Toshinori Kasuga , Hiroaki Tamura
- Applicant Address: JP Kawasaki
- Assignee: Fujitsu Limited
- Current Assignee: Fujitsu Limited
- Current Assignee Address: JP Kawasaki
- Agency: Fujitsu Patent Center
- Priority: JP2009-191287 20090820
- Main IPC: B08B3/12
- IPC: B08B3/12
Abstract:
A cleaning apparatus includes: a supply unit to supply at least an initial amount of cleaning solution to a specific portion of an object to be cleaned; an agitator to induce agitation in the cleaning solution supplied to the object; a monitoring unit to monitor an amount of the cleaning solution and to provide a signal indicative thereof; and a control unit to detect a threshold amount of reduction in the cleaning solution based on the signal from the monitoring unit and accordingly to control the supply unit to supply an additional amount of cleaning solution to the specific portion of the object.
Public/Granted literature
- US20110041879A1 CLEANING APPARATUS AND CLEANING METHOD Public/Granted day:2011-02-24
Information query
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