The present invention provides an imprint apparatus which transfers a pattern of a mold onto a resin applied on a substrate, including a structure including a mold chuck which holds the mold, a first measurement unit configured to measure a position of a reference portion of the structure, a second measurement unit configured to measure a position of the mold with respect to the reference portion, and a controller configured to control a relative positional relationship between the mold and the substrate, based on the measurement result obtained by the first measurement unit and the measurement result obtained by the second measurement unit, the second measurement unit including a head formed on the mold chuck, and measuring the position of the mold with respect to the reference portion by reading a scale formed on the mold by the head.