Invention Grant
- Patent Title: Hydrogen supply device
- Patent Title (中): 供氢装置
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Application No.: US12867899Application Date: 2009-02-18
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Publication No.: US08496736B2Publication Date: 2013-07-30
- Inventor: Junya Nishino , Katsumi Takahashi , Hiroyuki Obara
- Applicant: Junya Nishino , Katsumi Takahashi , Hiroyuki Obara
- Applicant Address: JP JP
- Assignee: IHI Corporation,Tamagawa K-12 & University
- Current Assignee: IHI Corporation,Tamagawa K-12 & University
- Current Assignee Address: JP JP
- Agency: Ostrolenk Faber LLP
- Priority: JPP2008-037979 20080219
- International Application: PCT/JP2009/052776 WO 20090218
- International Announcement: WO2009/104638 WO 20090827
- Main IPC: B01D53/22
- IPC: B01D53/22

Abstract:
The present invention relates to a hydrogen supply device which supplies hydrogen by selectively permitting permeation of hydrogen contained in a hydrogen containing gas (G1). This device includes: a first metal layer (2) which dissociates hydrogen molecules into hydrogen ions by a catalytic reaction and has hydrogen permeability; a second metal layer (3) which creates hydrogen molecules by bonding hydrogen ions to each other using electrons and has hydrogen permeability; a hydrogen permeation layer (1) which is interposed between the first metal layer (2) and the second metal layer (3) and permits permeation of the hydrogen ions from the first metal layer (2) to the second metal layer (3) by the application of a voltage; and a voltage application (7) for applying the voltage to the hydrogen permeation layer (1) by setting the first metal layer (2) as an anode and setting the second metal layer (3) as a cathode. According to this device, even when the concentration of hydrogen is low, it is possible to dissociate hydrogen from a hydrogen containing gas, and to suppress noise during the operation of the device.
Public/Granted literature
- US20110076203A1 HYDROGEN SUPPLY DEVICE Public/Granted day:2011-03-31
Information query
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