Invention Grant
US08496871B2 Silica structure and method of producing the same, and heat insulating material
有权
二氧化硅结构及其制造方法，以及绝热材料
- Patent Title: Silica structure and method of producing the same, and heat insulating material
- Patent Title (中): 二氧化硅结构及其制造方法，以及绝热材料
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Application No.: US13060346Application Date: 2010-02-04
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Publication No.: US08496871B2Publication Date: 2013-07-30
- Inventor: Narihito Tatsuda , Kazuhisa Yano , Takashi Sasajima , Daisaku Sawada , Eiichi Kamiyama
- Applicant: Narihito Tatsuda , Kazuhisa Yano , Takashi Sasajima , Daisaku Sawada , Eiichi Kamiyama
- Applicant Address: JP Toyota
- Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee Address: JP Toyota
- Agency: Oliff & Berridge, PLC
- Priority: JP2009-025272 20090205
- International Application: PCT/IB2010/000221 WO 20100204
- International Announcement: WO2010/089654 WO 20100812
- Main IPC: B28B1/00
- IPC: B28B1/00
Abstract:
A silica structure includes mesoporous silica spheres; and connection portions each of which includes metal oxide, and each of which connects the mesoporous silica spheres to each other.
Public/Granted literature
- US20110278756A1 SILICA STRUCTURE AND METHOD OF PRODUCING THE SAME, AND HEAT INSULATING MATERIAL Public/Granted day:2011-11-17
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