Invention Grant
- Patent Title: High temperature stable amorphous silica-rich aluminosilicates
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Application No.: US13186861Application Date: 2011-07-20
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Publication No.: US08497018B2Publication Date: 2013-07-30
- Inventor: Sankar Sambasivan , Vikram Sharad Kaul , Francis Richard Chapman , Jeffrey William Donelan
- Applicant: Sankar Sambasivan , Vikram Sharad Kaul , Francis Richard Chapman , Jeffrey William Donelan
- Applicant Address: US IL Skokie
- Assignee: Applied Thin Films, Inc.
- Current Assignee: Applied Thin Films, Inc.
- Current Assignee Address: US IL Skokie
- Main IPC: C01B33/26
- IPC: C01B33/26 ; B32B37/00 ; B32B18/00 ; C04B35/195 ; C04B35/19
Abstract:
A solid amorphous silica-rich aluminosilicate composition is stable at temperatures up to 1500° C. or above and is capable of sustained use as a coating under high to extreme temperature conditions.
Public/Granted literature
- US20110281110A1 HIGH TEMPERATURE STABLE AMORPHOUS SILICA-RICH ALUMINOSILICATES Public/Granted day:2011-11-17
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