- Patent Title: Polyimide, polyamic acid and processes for the production thereof
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Application No.: US12453511Application Date: 2009-05-13
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Publication No.: US08497025B2Publication Date: 2013-07-30
- Inventor: Kazuyoshi Uera , Daisuke Ohno , Kenji Ishii
- Applicant: Kazuyoshi Uera , Daisuke Ohno , Kenji Ishii
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2008-127210 20080514
- Main IPC: C08G73/14
- IPC: C08G73/14 ; C08G63/06

Abstract:
A novel polyimide as a high molecular weight material having a low dielectric constant, a low dielectric loss tangent and low water absorptivity, a polyamic acid capable of generating the above polyimide, the above polyimide and the polyamic acid being obtained by reacting an aromatic diamine, obtained by introducing aromatic amino groups into both terminals of a specific bifunctional phenylene ether oligomer, with an acid anhydride, a process for the production of the polyimide, a process for the production of the polyimide, a film of the polyimide, and a laminate comprising the above film.
Public/Granted literature
- US20090286094A1 Polyimide, polyamic acid and processes for the production thereof Public/Granted day:2009-11-19
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