Invention Grant
US08497182B2 Sidewall thin film electrode with self-aligned top electrode and programmable resistance memory
有权
具有自对准上电极和可编程电阻存储器的侧壁薄膜电极
- Patent Title: Sidewall thin film electrode with self-aligned top electrode and programmable resistance memory
- Patent Title (中): 具有自对准上电极和可编程电阻存储器的侧壁薄膜电极
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Application No.: US13089934Application Date: 2011-04-19
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Publication No.: US08497182B2Publication Date: 2013-07-30
- Inventor: Hsiang-Lan Lung
- Applicant: Hsiang-Lan Lung
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A memory device includes an array of electrodes that includes thin film plates of electrode material. Multilayer strips are arranged as bit lines over respective columns in the array of electrodes, including a layer of memory material and a layer of top electrode material. The multilayer strips have a primary body and a protrusion having a width less than that of the primary body and is self-aligned with contact surfaces on the thin film plates. Memory material in the protrusion contacts surfaces on the distal ends of thin film plates of electrodes in the corresponding column in the array. The device can be made using a damascene process in self-aligned forms over the contact surfaces.
Public/Granted literature
- US20120267597A1 SIDEWALL THIN FILM ELECTRODE WITH SELF-ALIGNED TOP ELECTRODE AND PROGRAMMABLE RESISTANCE MEMORY Public/Granted day:2012-10-25
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