Invention Grant
- Patent Title: Inspection device
- Patent Title (中): 检查装置
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Application No.: US13420731Application Date: 2012-03-15
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Publication No.: US08497476B2Publication Date: 2013-07-30
- Inventor: Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Yoshihiko Naito , Yasushi Toma , Tsutomu Karimata , Takehide Hayashi , Kiwamu Tsukamoto , Tatsuya Kohama , Noboru Kobayashi
- Applicant: Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Yoshihiko Naito , Yasushi Toma , Tsutomu Karimata , Takehide Hayashi , Kiwamu Tsukamoto , Tatsuya Kohama , Noboru Kobayashi
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2011-057312 20110315; JP2011-105751 20110510; JP2012-015875 20120127
- Main IPC: G01N23/225
- IPC: G01N23/225

Abstract:
An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.
Public/Granted literature
- US20120235036A1 INSPECTION DEVICE Public/Granted day:2012-09-20
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