Invention Grant
- Patent Title: Chamber apparatus and method of maintaining target supply unit
- Patent Title (中): 维护目标供应单位的室内设备和方法
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Application No.: US13051649Application Date: 2011-03-18
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Publication No.: US08497489B2Publication Date: 2013-07-30
- Inventor: Takayuki Yabu , Kouji Kakizaki , Yukio Watanabe , Osamu Wakabayashi
- Applicant: Takayuki Yabu , Kouji Kakizaki , Yukio Watanabe , Osamu Wakabayashi
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: McDermott Will & Emery LLP
- Priority: JP2010-062380 20100318; JP2011-013014 20110125
- Main IPC: G01K5/00
- IPC: G01K5/00

Abstract:
A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.
Public/Granted literature
- US20110310365A1 CHAMBER APPARATUS AND METHOD OF MAINTAINING TARGET SUPPLY UNIT Public/Granted day:2011-12-22
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