Invention Grant
US08497563B2 Semiconductor device and method for its manufacture 有权
半导体装置及其制造方法

  • Patent Title: Semiconductor device and method for its manufacture
  • Patent Title (中): 半导体装置及其制造方法
  • Application No.: US12733753
    Application Date: 2008-09-15
  • Publication No.: US08497563B2
    Publication Date: 2013-07-30
  • Inventor: Ning QuAlfred Goerlach
  • Applicant: Ning QuAlfred Goerlach
  • Applicant Address: DE Stuttgart
  • Assignee: Robert Bosch GmbH
  • Current Assignee: Robert Bosch GmbH
  • Current Assignee Address: DE Stuttgart
  • Agency: Kenyon & Kenyon LLP
  • Priority: DE102007045185 20070921
  • International Application: PCT/EP2008/062251 WO 20080915
  • International Announcement: WO2009/040265 WO 20090402
  • Main IPC: H01L29/66
  • IPC: H01L29/66
Semiconductor device and method for its manufacture
Abstract:
A semiconductor system having a trench MOS barrier Schottky diode, having an integrated substrate PN diode as a clamping element (TMBS-ub-PN), suitable in particular as a Zener diode having a breakdown voltage of approximately 20V for use in a vehicle generator system, the TMBS-sub-PN being made up of a combination of Schottky diode, MOS structure, and substrate PN diode, and the breakdown voltage of substrate PN diode BV_pn being lower than the breakdown voltage of Schottky diode BV_schottky and the breakdown voltage of MOS structure BV_mos.
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