Invention Grant
US08497586B2 Package module structure for high power device with metal substrate and method of manufacturing the same 有权
具有金属基板的大功率器件的封装模块结构及其制造方法

  • Patent Title: Package module structure for high power device with metal substrate and method of manufacturing the same
  • Patent Title (中): 具有金属基板的大功率器件的封装模块结构及其制造方法
  • Application No.: US13520284
    Application Date: 2010-02-16
  • Publication No.: US08497586B2
    Publication Date: 2013-07-30
  • Inventor: Kyoung-Min KimJung-Hyun Kim
  • Applicant: Kyoung-Min KimJung-Hyun Kim
  • Applicant Address: KR Gyeonggi-Do KR Daejeon
  • Assignee: Lumens Co., Ltd.,Wavenics, Inc.
  • Current Assignee: Lumens Co., Ltd.,Wavenics, Inc.
  • Current Assignee Address: KR Gyeonggi-Do KR Daejeon
  • Agency: Mayer & Williams P.C.
  • Agent Stuart H. Mayer
  • Priority: KR10-2010-0000150 20100104
  • International Application: PCT/KR2010/000953 WO 20100216
  • International Announcement: WO2011/081249 WO 20110707
  • Main IPC: H01L29/02
  • IPC: H01L29/02
Package module structure for high power device with metal substrate and method of manufacturing the same
Abstract:
A method of manufacturing a package module structure of a high power device using a metal substrate that can improve reliability by minimizing stress due to a thermal expansion coefficient difference between a metal substrate and a semiconductor device includes: preparing a metal substrate; forming an oxide layer by selectively anodizing the metal substrate; forming a mounting groove for mounting a semiconductor device by etching a portion of the oxide layer; installing a shock-absorbing substrate that is made of a material having a thermal expansion coefficient in a range similar to a material of a semiconductor device to expose the entirety or a portion of a bottom portion of the mounting groove; mounting the semiconductor device in the shock-absorbing substrate exposed to the mounting groove; and electrically connecting an electrode terminal of the semiconductor device and an electrode line formed in an upper surface of the oxide layer.
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