Invention Grant
- Patent Title: Exposure apparatus and image forming apparatus
- Patent Title (中): 曝光装置和图像形成装置
-
Application No.: US12778621Application Date: 2010-05-12
-
Publication No.: US08497892B2Publication Date: 2013-07-30
- Inventor: Katsuhiko Nakaie
- Applicant: Katsuhiko Nakaie
- Applicant Address: JP Kanagawa
- Assignee: Fuji Xerox Co., Ltd.
- Current Assignee: Fuji Xerox Co., Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-262119 20091117
- Main IPC: B41J2/435
- IPC: B41J2/435 ; B41J27/00

Abstract:
An exposure apparatus includes a light source that emits a plurality of light beams, a substrate on which the light source is mounted, a positioning member provided on a housing and being in contact with a positioning surface provided around the light source to position the light source with respect to the housing in an optical axis direction, the housing accommodating an optical system that guides the light beams, and an attachment member attached to the housing and including a portion that extends in a direction substantially perpendicular to the optical axis direction and that is bent over, an end of the bent portion being attached to the substrate such that the positioning surface around the light source is urged against the positioning member and the substrate is attached to the housing.
Public/Granted literature
- US20110115869A1 EXPOSURE APPARATUS AND IMAGE FORMING APPARATUS Public/Granted day:2011-05-19
Information query
IPC分类: