Invention Grant
- Patent Title: Exhaust apparatus, processing apparatus, and device manufacturing method
- Patent Title (中): 排气装置，加工装置及装置的制造方法
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Application No.: US12640095Application Date: 2009-12-17
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Publication No.: US08497974B2Publication Date: 2013-07-30
- Inventor: Atsushi Umemura
- Applicant: Atsushi Umemura
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc IP Division
- Priority: JP2008-330368 20081225
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/54 ; G03B27/32 ; G03B27/68 ; G03B27/60 ; G03B27/64
Abstract:
An exhaust apparatus includes a structural member; a vacuum pump configured to exhaust a gas via the structural member; and a regulator configured to regulate a temperature of the structural member. The structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other. The apparatus is configured such that the vacuum pump exhausts a gas via the through hole.
Public/Granted literature
- US20100167216A1 EXHAUST APPARATUS, PROCESSING APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-07-01
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