Invention Grant
- Patent Title: Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
- Patent Title (中): 检测方法和装置,光刻设备,光刻处理单元和器件制造方法
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Application No.: US12795595Application Date: 2010-06-07
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Publication No.: US08497975B2Publication Date: 2013-07-30
- Inventor: Johannes Matheus Marie De Wit , Armand Eugene Albert Koolen
- Applicant: Johannes Matheus Marie De Wit , Armand Eugene Albert Koolen
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/68
- IPC: G03B27/68

Abstract:
A scatterometer configured to derive a property of a substrate, includes an optical arrangement that produces a beam of radiation. An objective lens is arranged to focus the beam of radiation onto a target on the substrate. The optical arrangement is arranged to change the divergence of the beam incident on the objective lens, thereby changing spherical aberration caused by the objective lens on the beam focused on the target. A detection arrangement is arranged to detect the beam of radiation after reflection or scattering from the substrate.
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