Invention Grant
US08497980B2 Holding apparatus, exposure apparatus, exposure method, and device manufacturing method
有权
保持装置，曝光装置，曝光方法和装置制造方法
- Patent Title: Holding apparatus, exposure apparatus, exposure method, and device manufacturing method
- Patent Title (中): 保持装置，曝光装置，曝光方法和装置制造方法
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Application No.: US12049973Application Date: 2008-03-17
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Publication No.: US08497980B2Publication Date: 2013-07-30
- Inventor: Hajime Yamamoto
- Applicant: Hajime Yamamoto
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/42 ; H01L21/683
Abstract:
A holding apparatus is provided with a holding member that has a holding surface that holds a substrate on which a pattern is to be formed, a plurality of first electrode members that are provided on the holding member and that generate electrostatic force in accordance with supplied voltage in order to attract the substrate to the holding surface, and a power supply device that is able to supply voltage to the first electrode members. The first electrode members are positioned in accordance with pattern information.
Public/Granted literature
- US20080309909A1 HOLDING APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD Public/Granted day:2008-12-18
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