Invention Grant
- Patent Title: Electrostatic chuck and method for producing the same
- Patent Title (中): 静电吸盘及其制造方法
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Application No.: US12877349Application Date: 2010-09-08
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Publication No.: US08498093B2Publication Date: 2013-07-30
- Inventor: Masao Nishioka
- Applicant: Masao Nishioka
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown
- Priority: JP2009-215997 20090917
- Main IPC: H01T23/00
- IPC: H01T23/00

Abstract:
An electrostatic chuck includes an electrostatic electrode embedded in a ceramic base having a wafer-supporting surface capable of holding a wafer, the electrostatic electrode being parallel to the wafer-supporting surface. The ceramic base is composed of a dense ceramic having a MgO content of 99% by weight or more. The electrostatic electrode is a disc-like electrode composed of, for example, at least one metal selected from the group consisting of Ni, Co, and Fe. The electrostatic electrode includes a conductive tablet connected to the center thereof. The tablet is exposed at the bottom of a counter-bored hole formed so as to reach the tablet from a back surface of the ceramic base, and is connected to a feeding terminal, composed of Ni, inserted into the counter-bored hole.
Public/Granted literature
- US20110063771A1 ELECTROSTATIC CHUCK AND METHOD FOR PRODUCING THE SAME Public/Granted day:2011-03-17
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