Invention Grant
- Patent Title: Interconnect structure
- Patent Title (中): 互连结构
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Application No.: US13136736Application Date: 2011-08-09
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Publication No.: US08498131B2Publication Date: 2013-07-30
- Inventor: Raymond Albert Fillion , Kevin Matthew Durocher , Richard Joseph Saia , Charles Gerard Woychik
- Applicant: Raymond Albert Fillion , Kevin Matthew Durocher , Richard Joseph Saia , Charles Gerard Woychik
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agent Jean K Testa
- Main IPC: H05K7/00
- IPC: H05K7/00

Abstract:
An interconnect structure includes an insulative web having a first surface and a second surface; a logic device secured to the second surface of the insulative web; a frame panel assembly including a frame base having a first surface and a second surface, a first frame insulative layer disposed between the frame base first surface and the insulative web second surface, an aperture extending through the frame base and first frame insulative layer, wherein at least a portion of the logic device is disposed within the aperture, and a first frame connector disposed between a first electrically conductive layer located on the frame base first surface, and a second electrically conductive layer located on a surface of the first frame insulative layer; a device connector disposed between an I/O contact on a surface of the logic device and a third electrical conductor located on a surface of the insulative web; and an insulative layer connector that is disposed between the third electrical conductor located on a surface of the insulative web and the second electrically conductive layer located on a surface of the first frame insulative layer.
Public/Granted literature
- US20110299821A1 Interconnect structure Public/Granted day:2011-12-08
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