Invention Grant
- Patent Title: Implantable electrode and method of making the same
- Patent Title (中): 可植入电极及其制造方法
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Application No.: US12396107Application Date: 2009-03-02
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Publication No.: US08498720B2Publication Date: 2013-07-30
- Inventor: David S. Pellinen , Mayurachat Gulari , Jamille Farraye Hetke , David J. Anderson , Daryl R. Kipke , Rio J. Vetter
- Applicant: David S. Pellinen , Mayurachat Gulari , Jamille Farraye Hetke , David J. Anderson , Daryl R. Kipke , Rio J. Vetter
- Applicant Address: US MI Ann Arbor
- Assignee: NeuroNexus Technologies, Inc.
- Current Assignee: NeuroNexus Technologies, Inc.
- Current Assignee Address: US MI Ann Arbor
- Agent Michael F. Scalise
- Main IPC: A61N1/00
- IPC: A61N1/00
Abstract:
The implantable electrode system of the preferred embodiments includes a conductor, an interconnect coupled to the conductor, an insulator that insulates the interconnect, and an anchor that is connected to both the conductor and the insulating element. The anchor is mechanically interlocked with at least one of the conductor and the insulator.
Public/Granted literature
- US20090234426A1 IMPLANTABLE ELECTRODE AND METHOD OF MAKING THE SAME Public/Granted day:2009-09-17
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