Invention Grant
- Patent Title: Method of manufacturing a thin-film magnetic head
- Patent Title (中): 制造薄膜磁头的方法
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Application No.: US13279978Application Date: 2011-10-24
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Publication No.: US08499435B2Publication Date: 2013-08-06
- Inventor: Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Kazuki Sato , Atsushi Iijima
- Applicant: Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Kazuki Sato , Atsushi Iijima
- Applicant Address: US CA Milpitas CN Hong Kong
- Assignee: Headway Technologies, Inc.,SAE Magnetics (H.K.) Ltd.
- Current Assignee: Headway Technologies, Inc.,SAE Magnetics (H.K.) Ltd.
- Current Assignee Address: US CA Milpitas CN Hong Kong
- Agency: Oliff & Berridge, PLC
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00

Abstract:
A thin-film magnetic head is constructed such that a main magnetic pole layer, a lower shield layer, an upper shield layer and a thin-film coil are laminated on a substrate. A method of manufacturing the thin-film magnetic head has a lower shield layer forming step. This step comprises a step of forming a first lower shield part in a lower shield planned area, including a planned line along the medium-opposing surface, a step of forming a partial lower seed layer having a partial arrangement structure in which the partial lower seed layer is arranged on a lower formation zone except a lower exception zone including the planned line, a step of forming a second lower shield part on the partial lower seed layer.
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