Invention Grant
- Patent Title: Plasma generation system and plasma generation method
- Patent Title (中): 等离子体发生系统和等离子体生成方法
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Application No.: US13437488Application Date: 2012-04-02
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Publication No.: US08501106B2Publication Date: 2013-08-06
- Inventor: Takehiko Sato , Tatsuyuki Nakatani , Tatsuo Kimura
- Applicant: Takehiko Sato , Tatsuyuki Nakatani , Tatsuo Kimura
- Applicant Address: JP Hiroshima
- Assignee: Toyo Advanced Technologies Co., Ltd.
- Current Assignee: Toyo Advanced Technologies Co., Ltd.
- Current Assignee Address: JP Hiroshima
- Priority: JP2005-269989 20050916
- Main IPC: B01J19/08
- IPC: B01J19/08

Abstract:
A plasma generation system and related method for generating plasma in a cavity of a narrow tube, the system including: a first electrode including a conductive member covered with an insulator or dielectric, the first electrode being inserted into the cavity of the narrow tube to generate the plasma; a power supply to apply an alternating voltage or pulse voltage to the first electrode; and a second electrode located outside the narrow tube and connected to the power supply, the power supply applying the alternating voltage or pulse voltage between the first electrode and the second electrode, wherein the conductive member is made of a wire, a portion of the narrow tube is provided between the first electrode and the second electrode, and the second electrode is arranged and shaped so that a discharge is unevenly performed in a circumferential direction of the first electrode.
Public/Granted literature
- US20120187086A1 PLASMA GENERATION SYSTEM AND PLASMA GENERATION METHOD Public/Granted day:2012-07-26
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