Invention Grant
- Patent Title: Coating compositions for use with an overcoated photoresist
- Patent Title (中): 用于外涂光致抗蚀剂的涂料组合物
-
Application No.: US12782350Application Date: 2010-05-18
-
Publication No.: US08501383B2Publication Date: 2013-08-06
- Inventor: Anthony Zampini , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
- Applicant: Anthony Zampini , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Edwards Wildman Palmer LLP
- Agent Peter F. Corless; Darryl P. Frickey
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07D251/34 ; C08G73/08
Abstract:
Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
Public/Granted literature
- US20110033800A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST Public/Granted day:2011-02-10
Information query
IPC分类:
