Invention Grant
- Patent Title: Positive-type radiation-sensitive composition, and resist pattern formation method
- Patent Title (中): 正型辐射敏感组合物和抗蚀剂图案形成方法
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Application No.: US13005536Application Date: 2011-01-13
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Publication No.: US08501385B2Publication Date: 2013-08-06
- Inventor: Yusuke Anno , Kouichi Fujiwara , Makoto Sugiura , Gouji Wakamatsu
- Applicant: Yusuke Anno , Kouichi Fujiwara , Makoto Sugiura , Gouji Wakamatsu
- Applicant Address: JP Tokyo
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Tokyo
- Agency: Ditthavong Mori & Steiner, P.C.
- Priority: JP2008-184103 20080715; JP2009-080196 20090327
- Main IPC: G03C1/00
- IPC: G03C1/00 ; G03F1/00
Abstract:
A positive-tone radiation-sensitive composition is used in a resist pattern-forming method as a first positive-tone radiation-sensitive composition. A positive-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer includes an acid-labile group and a crosslinkable group. The resist pattern-forming method includes providing the first positive-tone radiation-sensitive composition on a substrate to form a first resist pattern on the substrate. The first resist pattern is made to be inactive to light or heat so that the first resist pattern is insoluble in a second positive-tone radiation-sensitive composition. The second positive-tone radiation-sensitive composition is provided on the substrate to form a second resist pattern on the substrate on which the first resist pattern is formed.
Public/Granted literature
- US20110104612A1 POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD Public/Granted day:2011-05-05
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