Invention Grant
US08501553B2 Method for manufacturing thin film transistor (TFT) array substrate
有权
制造薄膜晶体管(TFT)阵列基板的方法
- Patent Title: Method for manufacturing thin film transistor (TFT) array substrate
- Patent Title (中): 制造薄膜晶体管(TFT)阵列基板的方法
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Application No.: US13527983Application Date: 2012-06-20
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Publication No.: US08501553B2Publication Date: 2013-08-06
- Inventor: Hsien Tang Hu , Chien Chih Hsiao , Chih Hung Tsai
- Applicant: Hsien Tang Hu , Chien Chih Hsiao , Chih Hung Tsai
- Applicant Address: TW Taipei County
- Assignee: Hannstar Display Corp.
- Current Assignee: Hannstar Display Corp.
- Current Assignee Address: TW Taipei County
- Agency: Lowe Hauptman Ham & Berner, LLP
- Priority: TW98108367A 20090316
- Main IPC: H01L21/84
- IPC: H01L21/84 ; H01L21/00

Abstract:
A TFT array substrate includes a substrate, at least one gate line and gate electrode, a gate insulating layer, and at least one channel component, source electrode, drain electrode and data line. The gate line and gate electrode are disposed on the substrate, wherein both of the gate line and gate electrode have first and second conductive layers, the first conductive layer is formed on the substrate, the first conductive layer contains molybdenum nitride , the second conductive layer is formed on the first conductive layer, and the second conductive layer contains copper. The gate insulating layer is disposed on the gate line, gate electrode and the substrate. The channel component is disposed on the gate insulating layer. The source electrode and drain electrode are disposed on the channel component, and data line is disposed on the gate insulating layer.
Public/Granted literature
- US20120264260A1 TFT ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2012-10-18
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