Invention Grant
- Patent Title: Methods and apparatus for classification of defects using surface height attributes
- Patent Title (中): 使用表面高度属性分类缺陷的方法和装置
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Application No.: US13252042Application Date: 2011-10-03
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Publication No.: US08502146B2Publication Date: 2013-08-06
- Inventor: Chien-Huei Chen , Hedong Yang , Cho H. Teh
- Applicant: Chien-Huei Chen , Hedong Yang , Cho H. Teh
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Okamoto & Benedicto LLP
- Main IPC: G01N23/00
- IPC: G01N23/00

Abstract:
One embodiment relates to a method of classifying a defect on a substrate surface. The method includes scanning a primary electron beam over a target region of the substrate surface causing secondary electrons to be emitted therefrom, wherein the target region includes the defect. The secondary electrons are detected from the target region using a plurality of at least two off-axis sensors so as to generate a plurality of image frames of the target region, each image frame of the target region including data from a different off-axis sensor. The plurality of image data frames are processed to generate a surface height map of the target region, and surface height attributes are determined for the defect. The surface height attributes for the defect are input into a defect classifier. Other embodiments, aspects and features are also disclosed.
Public/Granted literature
- US20130082174A1 METHODS AND APPARATUS FOR CLASSIFICATION OF DEFECTS USING SURFACE HEIGHT ATTRIBUTES Public/Granted day:2013-04-04
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