- Patent Title: Beam control assembly for ribbon beam of ions for ion implantation
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Application No.: US12957294Application Date: 2010-11-30
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Publication No.: US08502160B2Publication Date: 2013-08-06
- Inventor: Jiong Chen
- Applicant: Jiong Chen
- Applicant Address: US CA San Jose
- Assignee: Advanced Ion Beam Technology, Inc.
- Current Assignee: Advanced Ion Beam Technology, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Morrison & Foerster LLP
- Main IPC: G21K1/08
- IPC: G21K1/08

Abstract:
A beam control assembly to shape a ribbon beam of ions for ion implantation includes a first bar, second bar, first coil of windings of electrical wire, second coil of windings of electrical wire, first electrical power supply, and second electrical power supply. The first coil is disposed on the first bar. The first coil is the only coil disposed on the first bar. The second bar is disposed opposite the first bar with a gap defined between the first and second bars. The ribbon beam travels between the gap. The second coil is disposed on the second bar. The second coil is the only coil disposed on the second bar. The first electrical power supply is connected to the first coil without being electrically connected to any other coil. The second electrical power supply is connected to the second coil without being electrically connected to any other coil.
Public/Granted literature
- US20110068277A1 BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION Public/Granted day:2011-03-24
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