Invention Grant
US08502221B2 Semiconductor device with two metal oxide films and an oxide semiconductor film
有权
具有两个金属氧化物膜和氧化物半导体膜的半导体器件
- Patent Title: Semiconductor device with two metal oxide films and an oxide semiconductor film
- Patent Title (中): 具有两个金属氧化物膜和氧化物半导体膜的半导体器件
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Application No.: US13074582Application Date: 2011-03-29
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Publication No.: US08502221B2Publication Date: 2013-08-06
- Inventor: Shunpei Yamazaki
- Applicant: Shunpei Yamazaki
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2010-086407 20100402
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/10 ; H01L21/02

Abstract:
An object is to stabilize electric characteristics of a semiconductor device including an oxide semiconductor to increase reliability. The semiconductor device includes an insulating film; a first metal oxide film on and in contact with the insulating film; an oxide semiconductor film partly in contact with the first metal oxide film; source and drain electrodes electrically connected to the oxide semiconductor film; a second metal oxide film partly in contact with the oxide semiconductor film; a gate insulating film on and in contact with the second metal oxide film; and a gate electrode over the gate insulating film.
Public/Granted literature
- US20110240990A1 SEMICONDUCTOR DEVICE Public/Granted day:2011-10-06
Information query
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